Ministry of Science and Technology Releases New Material Technology Ultra High Purity Aluminum Target Project Application

According to the Ministry of Science and Technology, physical vapor deposition (PVD) is one of the key processes in the production of semiconductor chips and TFT-LCDs. Sputtering metal targets for PVD are more important in the production of semiconductor chips and TFT-LCD manufacturing processes. One of the raw materials, the larger amount of sputtered metal target is ultra-high purity aluminum and ultra-high purity aluminum alloy targets.

It can be seen that the key technologies for the development of large-size ultra-high-purity aluminum targets with independent intellectual property rights have been developed, and ultra-high-purity aluminum target products that meet the needs of the semiconductor industry and the TFT-LCD industry have been developed and have the potential for the development of related industries in China. Significance.

To provide fair, equitable and open choice of project undertakers, fully mobilize the enthusiasm of related companies, scientific research institutes and institutions of higher learning, and integrate the country in the fields of refining and refining aluminum, large-size aluminum plate deformation and professional preparation of sputtered metal targets. The strengths of R&D to carry out the work of this project, the Ministry of Science and Technology issued the "National High-tech Research and Development Program (863 Plan) new materials technology field "large-size ultra-high purity aluminum target manufacturing technology" key project application guide."

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